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Nature Communications, Published online: 21 October 2020; doi:10.1038/s41467-020-19210-0

Complexity and harsh working conditions pose limitations for fabrication of patterned materials. Here the authors report a single-step method for in situ deposition of materials that is based on semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. Image of JbIU H8ycTg